Please use this identifier to cite or link to this item: http://localhost/handle/Hannan/401
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dc.contributor.authorNagar, Saurabh. ;en_US
dc.contributor.authorChakrabarti, Subhananda. ;en_US
dc.date.accessioned2013en_US
dc.date.accessioned2020-04-28T08:53:52Z-
dc.date.available2020-04-28T08:53:52Z-
dc.date.issued2017en_US
dc.identifier.isbn9789811008092 ;en_US
dc.identifier.isbn9789811008085 (print) ;en_US
dc.identifier.urihttp://localhost/handle/Hannan/401-
dc.descriptionen_US
dc.descriptionen_US
dc.descriptionPrinted edition: ; 9789811008085. ;en_US
dc.descriptionen_US
dc.descriptionSpringerLink (Online service) ;en_US
dc.descriptionen_US
dc.descriptionen_US
dc.description.abstractThis monograph describes the different implantation mechanisms which can be used to achieve strong, reliable and stable p-type ZnO thin films. The results will prove useful in the field of optoelectronics in the UV region. This book will prove useful to research scholars and professionals working on doping and implantation of ZnO thin films and subsequently fabricating optoelectronic devices. The first chapter of the monograph emphasises the importance of ZnO in the field of optoelectronics for ultraviolet (UV) region and also discusses the material, electronic and optical properties of ZnO. The book then goes on to discuss the optimization of pulsed laser deposited (PLD) ZnO thin films in order to make successful p-type films. This can enable achievement of high optical output required for high-efficiency devices. The book also discusses a hydrogen implantation study on the optimized films to confirm whether the implantation leads to improvement in the optimized results. ;en_US
dc.description.statementofresponsibilityby Saurabh Nagar, Subhananda Chakrabarti.en_US
dc.description.tableofcontentsIntroduction -- Optimisation of PLD Parameters -- Implantation Studies -- Fabrication of Optoelectronics Devices -- Summary and Future Works. ;en_US
dc.format.extentXIX, 83 p. 67 illus., 36 illus. in color. ; online resource. ;en_US
dc.publisherSpringer Singapore :en_US
dc.publisherImprint: Springer,en_US
dc.relation.haspart9789811008092.pdfen_US
dc.subjectMaterials Scienceen_US
dc.subjectElectronic circuits. ;en_US
dc.subjectOptical materials. ;en_US
dc.subjectElectronic materials. ;en_US
dc.subjectMaterials ; Surfaces. ;en_US
dc.subjectThin films. ;en_US
dc.subjectMaterials Scienceen_US
dc.subjectOptical and Electronic Materials. ;en_US
dc.subjectCircuits and Systems. ;en_US
dc.subjectSurfaces and Interfaces, Thin Films. ;en_US
dc.subjectOptics, Lasers, Photonics, Optical Devices. ;en_US
dc.titleOptimisation of ZnO Thin Filmsen_US
dc.title.alternativeImplants, Properties, and Device Fabrication /en_US
dc.typeBooken_US
dc.publisher.placeSingapore :en_US
dc.classification.lcTA1750-1750.22 ;en_US
dc.classification.dc620.11295 ; 23 ;en_US
dc.classification.dc620.11297 ; 23 ;en_US
Appears in Collections:مهندسی مدیریت ساخت

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Full metadata record
DC FieldValueLanguage
dc.contributor.authorNagar, Saurabh. ;en_US
dc.contributor.authorChakrabarti, Subhananda. ;en_US
dc.date.accessioned2013en_US
dc.date.accessioned2020-04-28T08:53:52Z-
dc.date.available2020-04-28T08:53:52Z-
dc.date.issued2017en_US
dc.identifier.isbn9789811008092 ;en_US
dc.identifier.isbn9789811008085 (print) ;en_US
dc.identifier.urihttp://localhost/handle/Hannan/401-
dc.descriptionen_US
dc.descriptionen_US
dc.descriptionPrinted edition: ; 9789811008085. ;en_US
dc.descriptionen_US
dc.descriptionSpringerLink (Online service) ;en_US
dc.descriptionen_US
dc.descriptionen_US
dc.description.abstractThis monograph describes the different implantation mechanisms which can be used to achieve strong, reliable and stable p-type ZnO thin films. The results will prove useful in the field of optoelectronics in the UV region. This book will prove useful to research scholars and professionals working on doping and implantation of ZnO thin films and subsequently fabricating optoelectronic devices. The first chapter of the monograph emphasises the importance of ZnO in the field of optoelectronics for ultraviolet (UV) region and also discusses the material, electronic and optical properties of ZnO. The book then goes on to discuss the optimization of pulsed laser deposited (PLD) ZnO thin films in order to make successful p-type films. This can enable achievement of high optical output required for high-efficiency devices. The book also discusses a hydrogen implantation study on the optimized films to confirm whether the implantation leads to improvement in the optimized results. ;en_US
dc.description.statementofresponsibilityby Saurabh Nagar, Subhananda Chakrabarti.en_US
dc.description.tableofcontentsIntroduction -- Optimisation of PLD Parameters -- Implantation Studies -- Fabrication of Optoelectronics Devices -- Summary and Future Works. ;en_US
dc.format.extentXIX, 83 p. 67 illus., 36 illus. in color. ; online resource. ;en_US
dc.publisherSpringer Singapore :en_US
dc.publisherImprint: Springer,en_US
dc.relation.haspart9789811008092.pdfen_US
dc.subjectMaterials Scienceen_US
dc.subjectElectronic circuits. ;en_US
dc.subjectOptical materials. ;en_US
dc.subjectElectronic materials. ;en_US
dc.subjectMaterials ; Surfaces. ;en_US
dc.subjectThin films. ;en_US
dc.subjectMaterials Scienceen_US
dc.subjectOptical and Electronic Materials. ;en_US
dc.subjectCircuits and Systems. ;en_US
dc.subjectSurfaces and Interfaces, Thin Films. ;en_US
dc.subjectOptics, Lasers, Photonics, Optical Devices. ;en_US
dc.titleOptimisation of ZnO Thin Filmsen_US
dc.title.alternativeImplants, Properties, and Device Fabrication /en_US
dc.typeBooken_US
dc.publisher.placeSingapore :en_US
dc.classification.lcTA1750-1750.22 ;en_US
dc.classification.dc620.11295 ; 23 ;en_US
dc.classification.dc620.11297 ; 23 ;en_US
Appears in Collections:مهندسی مدیریت ساخت

Files in This Item:
File Description SizeFormat 
9789811008092.pdf4.55 MBAdobe PDFThumbnail
Preview File
Full metadata record
DC FieldValueLanguage
dc.contributor.authorNagar, Saurabh. ;en_US
dc.contributor.authorChakrabarti, Subhananda. ;en_US
dc.date.accessioned2013en_US
dc.date.accessioned2020-04-28T08:53:52Z-
dc.date.available2020-04-28T08:53:52Z-
dc.date.issued2017en_US
dc.identifier.isbn9789811008092 ;en_US
dc.identifier.isbn9789811008085 (print) ;en_US
dc.identifier.urihttp://localhost/handle/Hannan/401-
dc.descriptionen_US
dc.descriptionen_US
dc.descriptionPrinted edition: ; 9789811008085. ;en_US
dc.descriptionen_US
dc.descriptionSpringerLink (Online service) ;en_US
dc.descriptionen_US
dc.descriptionen_US
dc.description.abstractThis monograph describes the different implantation mechanisms which can be used to achieve strong, reliable and stable p-type ZnO thin films. The results will prove useful in the field of optoelectronics in the UV region. This book will prove useful to research scholars and professionals working on doping and implantation of ZnO thin films and subsequently fabricating optoelectronic devices. The first chapter of the monograph emphasises the importance of ZnO in the field of optoelectronics for ultraviolet (UV) region and also discusses the material, electronic and optical properties of ZnO. The book then goes on to discuss the optimization of pulsed laser deposited (PLD) ZnO thin films in order to make successful p-type films. This can enable achievement of high optical output required for high-efficiency devices. The book also discusses a hydrogen implantation study on the optimized films to confirm whether the implantation leads to improvement in the optimized results. ;en_US
dc.description.statementofresponsibilityby Saurabh Nagar, Subhananda Chakrabarti.en_US
dc.description.tableofcontentsIntroduction -- Optimisation of PLD Parameters -- Implantation Studies -- Fabrication of Optoelectronics Devices -- Summary and Future Works. ;en_US
dc.format.extentXIX, 83 p. 67 illus., 36 illus. in color. ; online resource. ;en_US
dc.publisherSpringer Singapore :en_US
dc.publisherImprint: Springer,en_US
dc.relation.haspart9789811008092.pdfen_US
dc.subjectMaterials Scienceen_US
dc.subjectElectronic circuits. ;en_US
dc.subjectOptical materials. ;en_US
dc.subjectElectronic materials. ;en_US
dc.subjectMaterials ; Surfaces. ;en_US
dc.subjectThin films. ;en_US
dc.subjectMaterials Scienceen_US
dc.subjectOptical and Electronic Materials. ;en_US
dc.subjectCircuits and Systems. ;en_US
dc.subjectSurfaces and Interfaces, Thin Films. ;en_US
dc.subjectOptics, Lasers, Photonics, Optical Devices. ;en_US
dc.titleOptimisation of ZnO Thin Filmsen_US
dc.title.alternativeImplants, Properties, and Device Fabrication /en_US
dc.typeBooken_US
dc.publisher.placeSingapore :en_US
dc.classification.lcTA1750-1750.22 ;en_US
dc.classification.dc620.11295 ; 23 ;en_US
dc.classification.dc620.11297 ; 23 ;en_US
Appears in Collections:مهندسی مدیریت ساخت

Files in This Item:
File Description SizeFormat 
9789811008092.pdf4.55 MBAdobe PDFThumbnail
Preview File